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Name
Low Pressure Diffusion/Oxidation System
Affiliate classification
Low Pressure Diffusion/Oxidation System
Details
Parameters
Characteristics
Used for diffusion, oxidation process and annealing, alloy process, main characteristic and advanteges:
Specially high square resistance technology, 110Ω/□,nonuniformity is less than 4%, suitable for high efficiency cell research and production.
High efficiency and reliability, independently modular automatic load/unload system.
Low pressure diffusion process
Capacity: 800-1000 wafers/tube
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