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Ion Implanter
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Ion Implanter

We have devoted to designing and manufacturing of ion implanters since 1970s, and possesses a solid technical foundation and strong research & development capabilities. We are currently able to manufacture medium current, high current and high energy ion implanters for 8 or 12 inch wafers. Thereinto, the medium current ion implanters have been applied to mass production lines of large scale integrated circuits.
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We have devoted to designing and manufacturing of ion implanters since 1970s, and possesses a solid technical foundation and strong research & development capabilities.
We are currently able to manufacture medium current, high current and high energy ion implanters for 8 or 12 inch wafers. Thereinto, the medium current ion implanters have been applied to mass production lines of large scale integrated circuits.
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中束流离子注入机:
                  中束流,剂量2E11-1E16 ions/cm2
                  200mm/300mm,静电吸盘,单片注入
                  单电荷1kev-300kev,最高三电荷900kev
                  平行束,水平、垂直二维角度检测与修
 特种离子注入机:
                  多元素注入: B+、P+、H+、He+、Ar+、O+、 Ni+、Zr+、Mo+、Fe+等;
                  批装载,单片注入,基片尺寸为3-6”
                  单电荷1KeV-300KeV;
                  低温靶(液氮冷却)、常温靶、高温靶(600℃)三种靶盘可选。
 大束流离子注入机:
                 大束流,剂量2 E 12 - 2 E 17 ions/cm2
                 300mm,静电吸盘,单片注入
                 单电荷200ev-50KeV
                 200ev,B+束流大于2mA
                 宽带束,水平角度检测与修正
 高能离子注入机:
                 300mm,静电吸盘,单片注入;
                 单电荷10KeV-1500KeV;
                 平行束,水平角度检测与修正;
                 最大生产率,250片/小时;
                 注入均匀性和重复性可达0.5%。

 

暂未实现,敬请期待
暂未实现,敬请期待
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